Equipment: MRI: Track 2 Acquisition of Electron Beam Lithography System for Multidisciplin — NSF Award to University of California
The ability to create nanoscale structures and materials has enabled groundbreaking advances in various science and nanotechnology applications. Electron beam lithography (EBL) is one of the most reliable and important techniques for creating ultrasmall nanostructures and nanomaterials. Many ongoing projects in the STE
| Award title | Equipment: MRI: Track 2 Acquisition of Electron Beam Lithography System for Multidisciplin |
|---|---|
| Award ID | 2408857 |
| Awardee | University of California-Irvine |
| City | IRVINE |
| State | CA |
| Amount obligated | $1,409,000 |
| Principal investigator | Ho Wai Howard Lee |
| Program | Major Research Instrumentation |
| Start date | 09/01/2024 |
| Abstract | The ability to create nanoscale structures and materials has enabled groundbreaking advances in various science and nanotechnology applications. Electron beam lithography (EBL) is one of the most reliable and important techniques for creating ultrasmall nanostructures and nanomaterials. Many ongoing projects in the STEM disciplines have an urgent need for the proposed instrument. The long-range objective in acquiring the proposed equipment is to form a nanofabrication hub at the University of Ca |
| Source | NSF Awards |
$799/mo
Try NSFGrants →