FMSG: Eco: Solvent-Free Processing of Metal-Imidazolate EUV Photoresists for Semiconductor — NSF Award to Johns Hopkins University
Microelectronic device manufacturing for the production of computer chips depends on lithographic processes. Lithography enables creation of detailed patterns and features needed for making integrated circuits (ICs). This process uses a thin layer of material, called a resist, which when exposed to light undergoes chem
| Award title | FMSG: Eco: Solvent-Free Processing of Metal-Imidazolate EUV Photoresists for Semiconductor |
|---|---|
| Award ID | 2428276 |
| Awardee | Johns Hopkins University |
| City | BALTIMORE |
| State | MD |
| Amount obligated | $500,000 |
| Principal investigator | Michael Tsapatsis |
| Program | FM-Future Manufacturing |
| Start date | 05/01/2025 |
| Abstract | Microelectronic device manufacturing for the production of computer chips depends on lithographic processes. Lithography enables creation of detailed patterns and features needed for making integrated circuits (ICs). This process uses a thin layer of material, called a resist, which when exposed to light undergoes chemical reactions that persist after subsequent developing processes. To meet the demand for smaller, more powerful chips, extreme ultraviolet (EUV) light is now used in lithography. |
| Source | NSF Awards |
$799/mo
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