SBIR Phase II: Liquid-Enabled Advanced Pitch (LEAP) Semiconductor Manufacturing — NSF Award to GEMINATIO INC. (NY, $1,250,000)
The broader/commercial impact of this Small Business Innovation Research (SBIR) Phase II project is the significant enhancement of domestic semiconductor manufacturing capabilities using existing lithography equipment and foundries. This project addresses the industry’s need for cost-effective, high-density semiconduct
| Award title | SBIR Phase II: Liquid-Enabled Advanced Pitch (LEAP) Semiconductor Manufacturing |
|---|---|
| Award ID | 2507354 |
| Awardee | GEMINATIO INC. |
| City | SCHENECTADY |
| State | NY |
| Amount obligated | $1,250,000 |
| Principal investigator | Max Klemes |
| Program | SBIR Phase II |
| Start date | 08/01/2025 |
| Abstract | The broader/commercial impact of this Small Business Innovation Research (SBIR) Phase II project is the significant enhancement of domestic semiconductor manufacturing capabilities using existing lithography equipment and foundries. This project addresses the industry’s need for cost-effective, high-density semiconductor production without substantial capital investment in Extreme Ultraviolet (EUV) tools. The proposed process takes a photoresist pattern through a series of conventional track pro |
| Source | NSF Awards |
$799/mo
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