SBIR Phase II: Physics-Guided AI Platform for Accelerating Extreme Ultraviolet (EUV) Mask — NSF Award to EXIGENT SOLUTIONS, INC. (
The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase II project is to strengthen domestic semiconductor manufacturing capacity at a time of global supply-chain realignment and unprecedented demand for advanced chips. By providing an intelligent software platform that shortens
| Award title | SBIR Phase II: Physics-Guided AI Platform for Accelerating Extreme Ultraviolet (EUV) Mask |
|---|---|
| Award ID | 2528393 |
| Awardee | EXIGENT SOLUTIONS, INC. |
| City | AUBREY |
| State | TX |
| Amount obligated | $1,168,940 |
| Principal investigator | Paul Lou |
| Program | SBIR Phase II |
| Start date | 09/01/2025 |
| Abstract | The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase II project is to strengthen domestic semiconductor manufacturing capacity at a time of global supply-chain realignment and unprecedented demand for advanced chips. By providing an intelligent software platform that shortens design-to-manufacturing cycles, the project supports faster delivery of high-performance, energy-efficient electronics that underpin cloud computing, artificial intelligence (AI), |
| Source | NSF Awards |
$799/mo
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